{"id":6224,"date":"2025-10-02T17:52:27","date_gmt":"2025-10-02T09:52:27","guid":{"rendered":"https:\/\/www.ukm.my\/imen\/?page_id=6224"},"modified":"2025-11-30T17:45:56","modified_gmt":"2025-11-30T09:45:56","slug":"mems-nems-lab","status":"publish","type":"page","link":"https:\/\/www.ukm.my\/imen\/mems-nems-lab\/","title":{"rendered":"MEMS\/NEMS Lab"},"content":{"rendered":"\t\t
\t\t\t\t\t\t\t\t\t\t\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\tResearch in this laboratory focuses on the development of high-performance, low-cost, miniature electromechanical and electronic devices. We design and fabricate miniature sensors and actuator systems using CMOS-compatible processes, while research on nanoelectronics emphasizes 2D and carbon-based materials integrated with advanced nanostructures. Other areas of interest include silicon and compound semiconductors, nanometer-scale MEMS devices (NEMS), and MEMS technologies for biomedical applications.<\/p><\/li><\/ul>\t\t\t\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t
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\n\t\t\t\t\t\t\t\t\t<\/figure>\n\t\t\t\t\n\t\t\t\t\n\t\t\t<\/div>\n\n\t\t\tnurul_izzah@ukm.edu.my<\/p>\n\t\t\t\t\t\t\t<\/div>\n\t\t<\/div>\n\t<\/div>\n\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t
\t\t\t\t\t\t\t\t\t\t\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\tA high-resolution imaging system that uses a field emission electron source to provide detailed surface morphology and structural analysis of materials at the nanoscale.<\/p>
\u00a0<\/strong><\/p> How it works\/principle<\/strong><\/p> \u00a0<\/strong><\/p> Key features\/ advantage<\/strong><\/p> \u00a0<\/strong><\/p> Application<\/strong><\/p> A specialized dry etching system utilizing xenon difluoride (XeF\u2082) gas for isotropic etching of silicon and related materials, widely used in MEMS and semiconductor fabrication.<\/p> \u00a0<\/strong><\/p> How it works\/principle<\/strong><\/p> \u00a0<\/strong><\/p> Key features\/ advantage<\/strong><\/p> A<\/strong>pplication<\/strong><\/p> A compact and versatile spin coating system (CY-SP4) designed for producing uniform thin films on substrates with precise control of coating parameters.<\/p> \u00a0<\/strong><\/p> How it works\/principle<\/strong><\/p> Key features\/ advantage<\/strong><\/p> \u00a0<\/strong><\/p> Application<\/strong><\/p> \u00a0<\/p><\/li><\/ul>\t\t\t\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t\t<\/details>\n\t\t\t\t\t\t A scanning electron microscope for fast characterization and high-resolution imaging of a wide variety of sample types.\u00a0<\/p> How It Works \/ Principle<\/b> It uses a highly focused beam of electrons to scan a sample’s surface. By detecting the scattered or emitted electrons and X-rays, it creates a detailed image and can analyze the sample’s composition.<\/p><\/li> Key Features & Advantages<\/b><\/p> Magnification:<\/b> 5x to 300,000x<\/p><\/li> High-Voltage Resolution:<\/b> Up to 3.0 nm<\/p><\/li> Max Sample Size:<\/b> 150 mm diameter<\/p><\/li> Low Vacuum Mode:<\/b> Allows for observation of non-conductive samples without coating.<\/p><\/li><\/ul><\/li> Applications<\/b> Imaging fine features of integrated circuits (ICs) and monitoring the quality of thin films, photoresist patterns, and etching processes at the nanoscale.<\/p><\/li><\/ul><\/li><\/ul>\t\t\t\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t\t<\/details>\n\t\t\t\t\t\t A scanning electron microscope for fast characterization and high-resolution imaging of a wide variety of sample types.\u00a0<\/p> How It Works \/ Principle<\/b> It uses a highly focused beam of electrons to scan a sample’s surface. By detecting the scattered or emitted electrons and X-rays, it creates a detailed image and can analyze the sample’s composition.<\/p><\/li> Key Features & Advantages<\/b><\/p> Magnification:<\/b> 5x to 300,000x<\/p><\/li> High-Voltage Resolution:<\/b> Up to 3.0 nm<\/p><\/li> Max Sample Size:<\/b> 150 mm diameter<\/p><\/li> Low Vacuum Mode:<\/b> Allows for observation of non-conductive samples without coating.<\/p><\/li><\/ul><\/li> Applications<\/b> Imaging fine features of integrated circuits (ICs) and monitoring the quality of thin films, photoresist patterns, and etching processes at the nanoscale.<\/p><\/li><\/ul><\/li><\/ul>\t\t\t\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t\t<\/details>\n\t\t\t\t\t\t A scanning electron microscope for fast characterization and high-resolution imaging of a wide variety of sample types.\u00a0<\/p> How It Works \/ Principle<\/b> It uses a highly focused beam of electrons to scan a sample’s surface. By detecting the scattered or emitted electrons and X-rays, it creates a detailed image and can analyze the sample’s composition.<\/p><\/li> Key Features & Advantages<\/b><\/p> Magnification:<\/b> 5x to 300,000x<\/p><\/li> High-Voltage Resolution:<\/b> Up to 3.0 nm<\/p><\/li> Max Sample Size:<\/b> 150 mm diameter<\/p><\/li> Low Vacuum Mode:<\/b> Allows for observation of non-conductive samples without coating.<\/p><\/li><\/ul><\/li> Applications<\/b> Imaging fine features of integrated circuits (ICs) and monitoring the quality of thin films, photoresist patterns, and etching processes at the nanoscale.<\/p><\/li><\/ul><\/li><\/ul>\t\t\t\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t\t<\/details>\n\t\t\t\t\t\t A scanning electron microscope for fast characterization and high-resolution imaging of a wide variety of sample types.\u00a0<\/p> How It Works \/ Principle<\/b> It uses a highly focused beam of electrons to scan a sample’s surface. By detecting the scattered or emitted electrons and X-rays, it creates a detailed image and can analyze the sample’s composition.<\/p><\/li>\n\t\t\t\t\t
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