{"id":6062,"date":"2025-09-30T15:34:13","date_gmt":"2025-09-30T07:34:13","guid":{"rendered":"https:\/\/www.ukm.my\/imen\/?page_id=6062"},"modified":"2025-11-10T21:06:40","modified_gmt":"2025-11-10T13:06:40","slug":"cleanroom","status":"publish","type":"page","link":"https:\/\/www.ukm.my\/imen\/cleanroom\/","title":{"rendered":"Cleanroom Lab."},"content":{"rendered":"\t\t<div data-elementor-type=\"wp-page\" data-elementor-id=\"6062\" class=\"elementor elementor-6062\" data-elementor-post-type=\"page\">\n\t\t\t\t<div data-particle_enable=\"false\" data-particle-mobile-disabled=\"false\" class=\"elementor-element elementor-element-609cfadb e-flex e-con-boxed e-con e-parent\" data-id=\"609cfadb\" data-element_type=\"container\" data-e-type=\"container\">\n\t\t\t\t\t<div class=\"e-con-inner\">\n\t\t\t\t<div class=\"elementor-element elementor-element-4d13e694 elementor-widget elementor-widget-heading\" data-id=\"4d13e694\" data-element_type=\"widget\" data-e-type=\"widget\" data-widget_type=\"heading.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t\t\t<h2 class=\"elementor-heading-title elementor-size-default\">CLEANROOM LAB.<\/h2>\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t<div data-particle_enable=\"false\" data-particle-mobile-disabled=\"false\" class=\"elementor-element elementor-element-5289a814 e-flex e-con-boxed e-con e-parent\" data-id=\"5289a814\" data-element_type=\"container\" data-e-type=\"container\">\n\t\t\t\t\t<div class=\"e-con-inner\">\n\t\t<div data-particle_enable=\"false\" data-particle-mobile-disabled=\"false\" class=\"elementor-element elementor-element-913692a e-con-full e-flex e-con e-child\" data-id=\"913692a\" data-element_type=\"container\" data-e-type=\"container\">\n\t\t\t\t<div class=\"elementor-element elementor-element-6255ee1b elementor-widget elementor-widget-image\" data-id=\"6255ee1b\" data-element_type=\"widget\" data-e-type=\"widget\" data-widget_type=\"image.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t\t\t\t\t\t\t\t\t\t\t\t\t<img fetchpriority=\"high\" decoding=\"async\" width=\"1024\" height=\"1024\" src=\"https:\/\/www.ukm.my\/imen\/wp-content\/uploads\/2025\/09\/makmal_cleanroom-1024x1024.png\" class=\"attachment-large size-large wp-image-6087\" alt=\"\" srcset=\"https:\/\/www.ukm.my\/imen\/wp-content\/uploads\/2025\/09\/makmal_cleanroom-1024x1024.png 1024w, https:\/\/www.ukm.my\/imen\/wp-content\/uploads\/2025\/09\/makmal_cleanroom-300x300.png 300w, https:\/\/www.ukm.my\/imen\/wp-content\/uploads\/2025\/09\/makmal_cleanroom-150x150.png 150w, https:\/\/www.ukm.my\/imen\/wp-content\/uploads\/2025\/09\/makmal_cleanroom-768x768.png 768w, https:\/\/www.ukm.my\/imen\/wp-content\/uploads\/2025\/09\/makmal_cleanroom.png 1052w\" sizes=\"(max-width: 1024px) 100vw, 1024px\" \/>\t\t\t\t\t\t\t\t\t\t\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t<div data-particle_enable=\"false\" data-particle-mobile-disabled=\"false\" class=\"elementor-element elementor-element-16902822 e-con-full e-flex e-con e-child\" data-id=\"16902822\" data-element_type=\"container\" data-e-type=\"container\">\n\t\t<div data-particle_enable=\"false\" data-particle-mobile-disabled=\"false\" class=\"elementor-element elementor-element-119a75bf e-con-full e-flex e-con e-child\" data-id=\"119a75bf\" data-element_type=\"container\" data-e-type=\"container\">\n\t\t\t\t<div class=\"elementor-element elementor-element-25b6465b elementor-widget elementor-widget-text-editor\" data-id=\"25b6465b\" data-element_type=\"widget\" data-e-type=\"widget\" data-widget_type=\"text-editor.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t\t\t\t\t\t\t<ul><li><p>Our MEMS Fabrication Laboratory supports the design, fabrication, and characterization of Micro-Electro-Mechanical Systems (MEMS) devices. <span class=\"citation-1 citation-end-1\">These micro-devices are created from silicon and similar materials using advanced micromachining processes derived from semiconductor fabrication technology.<\/span><\/p><p>The facility features a dedicated cleanroom environment essential for high-precision fabrication.<\/p><ul><li><p><b>Total Cleanroom Area<\/b>: 180 m\u00b2<\/p><\/li><li><p><b>Class 100 Zone<\/b>: A 40 m\u00b2 yellow-light area specifically designed for critical processes like <b>photolithography<\/b> and <b>wafer bonding<\/b>.<\/p><\/li><li><p><b>Class 1000 Zone<\/b>: A 140 m\u00b2 space for other fabrication and characterization activities.<\/p><\/li><\/ul><p>Originally built in 1995, the cleanroom was significantly upgraded in 2002 to house additional state-of-the-art equipment for MEMS research and development.<\/p><\/li><\/ul>\t\t\t\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t<div data-particle_enable=\"false\" data-particle-mobile-disabled=\"false\" class=\"elementor-element elementor-element-17a74bf7 e-con-full e-flex e-con e-child\" data-id=\"17a74bf7\" data-element_type=\"container\" data-e-type=\"container\">\n\t\t<div data-particle_enable=\"false\" data-particle-mobile-disabled=\"false\" class=\"elementor-element elementor-element-221d1162 e-grid e-con-full e-con e-child\" data-id=\"221d1162\" data-element_type=\"container\" data-e-type=\"container\">\n\t\t\t\t<div class=\"elementor-element elementor-element-6c90b877 eael-team-align-centered elementor-widget elementor-widget-eael-team-member\" data-id=\"6c90b877\" data-element_type=\"widget\" data-e-type=\"widget\" data-widget_type=\"eael-team-member.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t\t\t\n\n\t<div id=\"eael-team-member-6c90b877\" class=\"eael-team-item eael-team-members-circle \">\n\t\t<div class=\"eael-team-item-inner\">\n\t\t\t<div class=\"eael-team-image\">\n\t\t\t\t<figure>\n\t\t\t\t\t\t\t\t\t\t<img decoding=\"async\" src=\"https:\/\/www.ukm.my\/imen\/wp-content\/uploads\/2025\/09\/theme_pbym-150x150.png\" alt=\"\">\n\t\t\t\t\t\t\t\t\t<\/figure>\n\t\t\t\t\n\t\t\t\t\n\t\t\t<\/div>\n\n\t\t\t<div class=\"eael-team-content\">\n\t\t\t\t<h2 class=\"eael-team-member-name\">Head of Laboratory<\/h2><h3 class=\"eael-team-member-position\">Prof. Dato'. Dr. Burhanuddin Yeop Majlis<\/h3>\n\t\t\t\t\t\t\t\t\t\t\t\t\t\t<p class=\"eael-team-text\">\nburhan@ukm.edu.my<\/p>\n\t\t\t\t\t\t\t<\/div>\n\t\t<\/div>\n\t<\/div>\n\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-6f70f33e eael-team-align-eael-team-align-default elementor-widget elementor-widget-eael-team-member\" data-id=\"6f70f33e\" data-element_type=\"widget\" data-e-type=\"widget\" data-widget_type=\"eael-team-member.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t\t\t\n\n\t<div id=\"eael-team-member-6f70f33e\" class=\"eael-team-item eael-team-members-circle \">\n\t\t<div class=\"eael-team-item-inner\">\n\t\t\t<div class=\"eael-team-image\">\n\t\t\t\t<figure>\n\t\t\t\t\t\t\t\t\t\t<img decoding=\"async\" src=\"https:\/\/www.ukm.my\/imen\/wp-content\/uploads\/2025\/09\/so_anezah-150x150.png\" alt=\"\">\n\t\t\t\t\t\t\t\t\t<\/figure>\n\t\t\t\t\n\t\t\t\t\n\t\t\t<\/div>\n\n\t\t\t<div class=\"eael-team-content\">\n\t\t\t\t<h2 class=\"eael-team-member-name\">PIC Laboratory<\/h2><h3 class=\"eael-team-member-position\">Anezah Marsan<\/h3>\n\t\t\t\t\t\t\t\t\t\t\t\t\t\t<p class=\"eael-team-text\">anezahmarsan@ukm.edu.my<\/p>\n\t\t\t\t\t\t\t<\/div>\n\t\t<\/div>\n\t<\/div>\n\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-bec003a eael-team-align-eael-team-align-default elementor-widget elementor-widget-eael-team-member\" data-id=\"bec003a\" data-element_type=\"widget\" data-e-type=\"widget\" data-widget_type=\"eael-team-member.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t\t\t\n\n\t<div id=\"eael-team-member-bec003a\" class=\"eael-team-item eael-team-members-circle \">\n\t\t<div class=\"eael-team-item-inner\">\n\t\t\t<div class=\"eael-team-image\">\n\t\t\t\t<figure>\n\t\t\t\t\t\t\t\t\t\t<img decoding=\"async\" src=\"https:\/\/www.ukm.my\/imen\/wp-content\/uploads\/2025\/09\/so_faizal-150x150.png\" alt=\"\">\n\t\t\t\t\t\t\t\t\t<\/figure>\n\t\t\t\t\n\t\t\t\t\n\t\t\t<\/div>\n\n\t\t\t<div class=\"eael-team-content\">\n\t\t\t\t<h2 class=\"eael-team-member-name\">PIC Laboratory<\/h2><h3 class=\"eael-team-member-position\">Mohd Faizal Aziz<\/h3>\n\t\t\t\t\t\t\t\t\t\t\t\t\t\t<p class=\"eael-team-text\">faizal_imen@ukm.edu.my<\/p>\n\t\t\t\t\t\t\t<\/div>\n\t\t<\/div>\n\t<\/div>\n\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t<div data-particle_enable=\"false\" data-particle-mobile-disabled=\"false\" class=\"elementor-element elementor-element-3a705565 e-flex e-con-boxed e-con e-parent\" data-id=\"3a705565\" data-element_type=\"container\" data-e-type=\"container\">\n\t\t\t\t\t<div class=\"e-con-inner\">\n\t\t\t\t<div class=\"elementor-element elementor-element-7f0c18de elementor-widget elementor-widget-heading\" data-id=\"7f0c18de\" data-element_type=\"widget\" data-e-type=\"widget\" data-widget_type=\"heading.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t\t\t<h2 class=\"elementor-heading-title elementor-size-default\">EQUIPMENT \/ FACILITIES<\/h2>\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-7379570c elementor-widget elementor-widget-n-accordion\" data-id=\"7379570c\" data-element_type=\"widget\" data-e-type=\"widget\" data-settings=\"{&quot;default_state&quot;:&quot;expanded&quot;,&quot;max_items_expended&quot;:&quot;one&quot;,&quot;n_accordion_animation_duration&quot;:{&quot;unit&quot;:&quot;ms&quot;,&quot;size&quot;:400,&quot;sizes&quot;:[]}}\" data-widget_type=\"nested-accordion.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t\t\t\t\t<div class=\"e-n-accordion\" aria-label=\"Accordion. Open links with Enter or Space, close with Escape, and navigate with Arrow Keys\">\n\t\t\t\t\t\t<details id=\"e-n-accordion-item-1930\" class=\"e-n-accordion-item\" open>\n\t\t\t\t<summary class=\"e-n-accordion-item-title\" data-accordion-index=\"1\" tabindex=\"0\" aria-expanded=\"true\" aria-controls=\"e-n-accordion-item-1930\" >\n\t\t\t\t\t<span class='e-n-accordion-item-title-header'><div class=\"e-n-accordion-item-title-text\"> JEOL SCANNING ELECTRON MICROSCOPE <\/div><\/span>\n\t\t\t\t\t\t\t\t\t<\/summary>\n\t\t\t\t<div data-particle_enable=\"false\" data-particle-mobile-disabled=\"false\" role=\"region\" aria-labelledby=\"e-n-accordion-item-1930\" class=\"elementor-element elementor-element-63ef134 e-con-full e-flex e-con e-child\" data-id=\"63ef134\" data-element_type=\"container\" data-e-type=\"container\">\n\t\t<div data-particle_enable=\"false\" data-particle-mobile-disabled=\"false\" role=\"region\" aria-labelledby=\"e-n-accordion-item-1930\" class=\"elementor-element elementor-element-6a0357f1 e-flex e-con-boxed e-con e-child\" data-id=\"6a0357f1\" data-element_type=\"container\" data-e-type=\"container\">\n\t\t\t\t\t<div class=\"e-con-inner\">\n\t\t\t\t<div class=\"elementor-element elementor-element-603a1ec2 elementor-widget elementor-widget-image\" data-id=\"603a1ec2\" data-element_type=\"widget\" data-e-type=\"widget\" data-widget_type=\"image.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t\t\t\t\t\t\t\t\t\t\t\t\t<img decoding=\"async\" width=\"300\" height=\"300\" src=\"https:\/\/www.ukm.my\/imen\/wp-content\/uploads\/2025\/09\/inst_sem-300x300.png\" class=\"attachment-medium size-medium wp-image-6090\" alt=\"\" srcset=\"https:\/\/www.ukm.my\/imen\/wp-content\/uploads\/2025\/09\/inst_sem-300x300.png 300w, https:\/\/www.ukm.my\/imen\/wp-content\/uploads\/2025\/09\/inst_sem-150x150.png 150w, https:\/\/www.ukm.my\/imen\/wp-content\/uploads\/2025\/09\/inst_sem.png 383w\" sizes=\"(max-width: 300px) 100vw, 300px\" \/>\t\t\t\t\t\t\t\t\t\t\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-1344c7d elementor-widget elementor-widget-text-editor\" data-id=\"1344c7d\" data-element_type=\"widget\" data-e-type=\"widget\" data-widget_type=\"text-editor.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t\t\t\t\t\t\t<ul><li><p>A scanning electron microscope for fast characterization and high-resolution imaging of a wide variety of sample types.\u00a0<\/p><ul><li><p><b>How It Works \/ Principle<\/b> It uses a highly focused beam of electrons to scan a sample&#8217;s surface. By detecting the scattered or emitted electrons and X-rays, it creates a detailed image and can analyze the sample&#8217;s composition.<\/p><\/li><li><p><b>Key Features &amp; Advantages<\/b><\/p><ul><li><p><b>Magnification:<\/b> 5x to 300,000x<\/p><\/li><li><p><b>High-Voltage Resolution:<\/b> Up to 3.0 nm<\/p><\/li><li><p><b>Max Sample Size:<\/b> 150 mm diameter<\/p><\/li><li><p><b>Low Vacuum Mode:<\/b> Allows for observation of non-conductive samples without coating.<\/p><\/li><\/ul><\/li><li><p><b>Applications<\/b> Imaging fine features of integrated circuits (ICs) and monitoring the quality of thin films, photoresist patterns, and etching processes at the nanoscale.<\/p><\/li><\/ul><\/li><\/ul>\t\t\t\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t\t<\/details>\n\t\t\t\t\t\t<details id=\"e-n-accordion-item-1931\" class=\"e-n-accordion-item\" >\n\t\t\t\t<summary class=\"e-n-accordion-item-title\" data-accordion-index=\"2\" tabindex=\"-1\" aria-expanded=\"false\" aria-controls=\"e-n-accordion-item-1931\" >\n\t\t\t\t\t<span class='e-n-accordion-item-title-header'><div class=\"e-n-accordion-item-title-text\"> THIN FILM MAPPING <\/div><\/span>\n\t\t\t\t\t\t\t\t\t<\/summary>\n\t\t\t\t<div data-particle_enable=\"false\" data-particle-mobile-disabled=\"false\" role=\"region\" aria-labelledby=\"e-n-accordion-item-1931\" class=\"elementor-element elementor-element-339d88e4 e-con-full e-flex e-con e-child\" data-id=\"339d88e4\" data-element_type=\"container\" data-e-type=\"container\">\n\t\t<div data-particle_enable=\"false\" data-particle-mobile-disabled=\"false\" role=\"region\" aria-labelledby=\"e-n-accordion-item-1931\" class=\"elementor-element elementor-element-5ea59b4 e-flex e-con-boxed e-con e-child\" data-id=\"5ea59b4\" data-element_type=\"container\" data-e-type=\"container\">\n\t\t\t\t\t<div class=\"e-con-inner\">\n\t\t\t\t<div class=\"elementor-element elementor-element-562de85f elementor-widget elementor-widget-image\" data-id=\"562de85f\" data-element_type=\"widget\" data-e-type=\"widget\" data-widget_type=\"image.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t\t\t\t\t\t\t\t\t\t\t\t\t<img decoding=\"async\" width=\"300\" height=\"300\" src=\"https:\/\/www.ukm.my\/imen\/wp-content\/uploads\/2025\/09\/inst_thinfilmfilmetrics-300x300.png\" class=\"attachment-medium size-medium wp-image-6091\" alt=\"\" srcset=\"https:\/\/www.ukm.my\/imen\/wp-content\/uploads\/2025\/09\/inst_thinfilmfilmetrics-300x300.png 300w, https:\/\/www.ukm.my\/imen\/wp-content\/uploads\/2025\/09\/inst_thinfilmfilmetrics-150x150.png 150w, https:\/\/www.ukm.my\/imen\/wp-content\/uploads\/2025\/09\/inst_thinfilmfilmetrics.png 383w\" sizes=\"(max-width: 300px) 100vw, 300px\" \/>\t\t\t\t\t\t\t\t\t\t\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-38dbbee6 elementor-widget elementor-widget-text-editor\" data-id=\"38dbbee6\" data-element_type=\"widget\" data-e-type=\"widget\" data-widget_type=\"text-editor.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t\t\t\t\t\t\t<p>An advanced spectral reflectance system that maps thin-film thickness quickly and easily.<\/p><ul><li><p><b>How It Works \/ Principle<\/b> It works on the principle of spectral reflectance (thin-film interference), measuring how light reflects off a thin film to determine its thickness and optical properties (n and k) without touching the sample.<\/p><\/li><li><p><b>Model : <\/b>Filmetrics F50-2000<\/p><\/li><li><p><b>Key Features &amp; Advantages<\/b><\/p><ul><li><p><b>Automated Stage:<\/b> Automatically moves to selected measurement points.<\/p><\/li><li><p><b>High-Speed Measurement:<\/b> Provides thickness readings in seconds.<\/p><\/li><li><p><b>Flexible Map Patterns:<\/b> Can create detailed maps of thickness uniformity across a wafer.<\/p><\/li><\/ul><\/li><li><p><b>Applications<\/b> Measures the thickness and refractive index of films like <span aria-hidden=\"true\">SiO2<\/span>, <span aria-hidden=\"true\">Si3N4<\/span>, polysilicon, and photoresist. Essential for monitoring deposition and etching processes.<\/p><\/li><\/ul>\t\t\t\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t\t<\/details>\n\t\t\t\t\t\t<details id=\"e-n-accordion-item-1932\" class=\"e-n-accordion-item\" >\n\t\t\t\t<summary class=\"e-n-accordion-item-title\" data-accordion-index=\"3\" tabindex=\"-1\" aria-expanded=\"false\" aria-controls=\"e-n-accordion-item-1932\" >\n\t\t\t\t\t<span class='e-n-accordion-item-title-header'><div class=\"e-n-accordion-item-title-text\"> PLASMA-ENHANCED CHEMICAL VAPOR DEPOSITION (PECVD) <\/div><\/span>\n\t\t\t\t\t\t\t\t\t<\/summary>\n\t\t\t\t<div data-particle_enable=\"false\" data-particle-mobile-disabled=\"false\" role=\"region\" aria-labelledby=\"e-n-accordion-item-1932\" class=\"elementor-element elementor-element-ceffb68 e-con-full e-flex e-con e-child\" data-id=\"ceffb68\" data-element_type=\"container\" data-e-type=\"container\">\n\t\t<div data-particle_enable=\"false\" data-particle-mobile-disabled=\"false\" role=\"region\" aria-labelledby=\"e-n-accordion-item-1932\" class=\"elementor-element elementor-element-3d76ba85 e-flex e-con-boxed e-con e-child\" data-id=\"3d76ba85\" data-element_type=\"container\" data-e-type=\"container\">\n\t\t\t\t\t<div class=\"e-con-inner\">\n\t\t\t\t<div class=\"elementor-element elementor-element-176644d3 elementor-widget elementor-widget-text-editor\" data-id=\"176644d3\" data-element_type=\"widget\" data-e-type=\"widget\" data-widget_type=\"text-editor.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t\t\t\t\t\t\t<p>A deposition system used to create ultra-thin films with incredible precision for applications in materials science and beyond.<\/p><ul><li><p><b>How It Works \/ Principle<\/b> PECVD uses plasma energy to decompose precursor gases into reactive species, which then deposit onto a substrate as a thin film.<\/p><\/li><li><p><b>Key Features &amp; Advantages<\/b><\/p><ul><li><p><b>Low-Temperature Deposition:<\/b> Its primary advantage is the ability to deposit high-quality thin films at significantly lower temperatures by using plasma instead of high thermal energy.<\/p><\/li><\/ul><\/li><li><p><b>Applications<\/b> Creating thin films for advanced materials, microelectronics, and semiconductors.<\/p><\/li><\/ul>\t\t\t\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t\t<\/details>\n\t\t\t\t\t\t<details id=\"e-n-accordion-item-1933\" class=\"e-n-accordion-item\" >\n\t\t\t\t<summary class=\"e-n-accordion-item-title\" data-accordion-index=\"4\" tabindex=\"-1\" aria-expanded=\"false\" aria-controls=\"e-n-accordion-item-1933\" >\n\t\t\t\t\t<span class='e-n-accordion-item-title-header'><div class=\"e-n-accordion-item-title-text\"> DC\/RF MAGNETRON SPUTTER <\/div><\/span>\n\t\t\t\t\t\t\t\t\t<\/summary>\n\t\t\t\t<div data-particle_enable=\"false\" data-particle-mobile-disabled=\"false\" role=\"region\" aria-labelledby=\"e-n-accordion-item-1933\" class=\"elementor-element elementor-element-2a4c66fb e-con-full e-flex e-con e-child\" data-id=\"2a4c66fb\" data-element_type=\"container\" data-e-type=\"container\">\n\t\t<div data-particle_enable=\"false\" data-particle-mobile-disabled=\"false\" role=\"region\" aria-labelledby=\"e-n-accordion-item-1933\" class=\"elementor-element elementor-element-66df16d e-flex e-con-boxed e-con e-child\" data-id=\"66df16d\" data-element_type=\"container\" data-e-type=\"container\">\n\t\t\t\t\t<div class=\"e-con-inner\">\n\t\t\t\t<div class=\"elementor-element elementor-element-1ea20c6c elementor-widget elementor-widget-image\" data-id=\"1ea20c6c\" data-element_type=\"widget\" data-e-type=\"widget\" data-widget_type=\"image.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t\t\t\t\t\t\t\t\t\t\t\t\t<img loading=\"lazy\" decoding=\"async\" width=\"300\" height=\"300\" src=\"https:\/\/www.ukm.my\/imen\/wp-content\/uploads\/2025\/09\/inst_DCRFsputter-300x300.png\" class=\"attachment-medium size-medium wp-image-6092\" alt=\"\" srcset=\"https:\/\/www.ukm.my\/imen\/wp-content\/uploads\/2025\/09\/inst_DCRFsputter-300x300.png 300w, https:\/\/www.ukm.my\/imen\/wp-content\/uploads\/2025\/09\/inst_DCRFsputter-150x150.png 150w, https:\/\/www.ukm.my\/imen\/wp-content\/uploads\/2025\/09\/inst_DCRFsputter.png 383w\" sizes=\"(max-width: 300px) 100vw, 300px\" \/>\t\t\t\t\t\t\t\t\t\t\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-2e58a9d4 elementor-widget elementor-widget-text-editor\" data-id=\"2e58a9d4\" data-element_type=\"widget\" data-e-type=\"widget\" data-widget_type=\"text-editor.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t\t\t\t\t\t\t<p>A versatile deposition system that creates high-quality thin films with excellent adhesion using precise DC\/RF sputtering control.<\/p><ul><li><p><b>How It Works \/ Principle<\/b> The system utilizes two sputtering techniques, RF (Radio Frequency) and DC (Direct Current) sputtering, within the same chamber to deposit material onto a substrate.<\/p><\/li><li><p><b>Key Features &amp; Advantages<\/b><\/p><ul><li><p><b>Dual-Mode Operation:<\/b> Combines both DC and RF sputtering for maximum flexibility.<\/p><\/li><li><p><b>High-Quality Films:<\/b> Offers precise control for versatile deposition, producing films with excellent adhesion.<\/p><\/li><\/ul><\/li><li><p><b>Applications<\/b> Creating thin films for advanced materials, electronics, and semiconductor applications.<\/p><\/li><\/ul>\t\t\t\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t\t<\/details>\n\t\t\t\t\t\t<details id=\"e-n-accordion-item-1934\" class=\"e-n-accordion-item\" >\n\t\t\t\t<summary class=\"e-n-accordion-item-title\" data-accordion-index=\"5\" tabindex=\"-1\" aria-expanded=\"false\" aria-controls=\"e-n-accordion-item-1934\" >\n\t\t\t\t\t<span class='e-n-accordion-item-title-header'><div class=\"e-n-accordion-item-title-text\"> GOLD SPUTTER COATER <\/div><\/span>\n\t\t\t\t\t\t\t\t\t<\/summary>\n\t\t\t\t<div data-particle_enable=\"false\" data-particle-mobile-disabled=\"false\" role=\"region\" aria-labelledby=\"e-n-accordion-item-1934\" class=\"elementor-element elementor-element-95237f6 e-con-full e-flex e-con e-child\" data-id=\"95237f6\" data-element_type=\"container\" data-e-type=\"container\">\n\t\t<div data-particle_enable=\"false\" data-particle-mobile-disabled=\"false\" role=\"region\" aria-labelledby=\"e-n-accordion-item-1934\" class=\"elementor-element elementor-element-533fbe5 e-flex e-con-boxed e-con e-child\" data-id=\"533fbe5\" data-element_type=\"container\" data-e-type=\"container\">\n\t\t\t\t\t<div class=\"e-con-inner\">\n\t\t\t\t<div class=\"elementor-element elementor-element-3c8475f elementor-widget elementor-widget-image\" data-id=\"3c8475f\" data-element_type=\"widget\" data-e-type=\"widget\" data-widget_type=\"image.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t\t\t\t\t\t\t\t\t\t\t\t\t<img loading=\"lazy\" decoding=\"async\" width=\"300\" height=\"300\" src=\"https:\/\/www.ukm.my\/imen\/wp-content\/uploads\/2025\/09\/inst_Ausputtercoater-300x300.png\" class=\"attachment-medium size-medium wp-image-6093\" alt=\"\" srcset=\"https:\/\/www.ukm.my\/imen\/wp-content\/uploads\/2025\/09\/inst_Ausputtercoater-300x300.png 300w, https:\/\/www.ukm.my\/imen\/wp-content\/uploads\/2025\/09\/inst_Ausputtercoater-150x150.png 150w, https:\/\/www.ukm.my\/imen\/wp-content\/uploads\/2025\/09\/inst_Ausputtercoater.png 383w\" sizes=\"(max-width: 300px) 100vw, 300px\" \/>\t\t\t\t\t\t\t\t\t\t\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-c0f6635 elementor-widget elementor-widget-text-editor\" data-id=\"c0f6635\" data-element_type=\"widget\" data-e-type=\"widget\" data-widget_type=\"text-editor.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t\t\t\t\t\t\t<p>A Q150RS sputter coater used to apply a thin, electrically conductive gold film onto samples for Scanning Electron Microscopy (SEM).<\/p><ul><li><p><b>How It Works \/ Principle<\/b> It uses magnetron sputter deposition to apply a conductive layer of gold onto non-conductive samples. This film prevents specimen &#8216;charging&#8217;, reduces thermal damage, and enhances secondary electron emission for clearer imaging in an SEM.<\/p><\/li><li><b>Key Features &amp; Advantages<\/b><ul><li><p><b>Automated Control:<\/b> Features a fully automatic touch-and-swipe capacitive color screen for easy operation.<\/p><\/li><li><p><b>Optimized for SEM:<\/b> Specifically designed to prepare samples for high-resolution imaging.<\/p><\/li><\/ul><\/li><li><p><b>Applications<\/b> General-purpose thin film coating of gold (Au) for SEM sample preparation.<\/p><\/li><\/ul>\t\t\t\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t\t<\/details>\n\t\t\t\t\t\t<details id=\"e-n-accordion-item-1935\" class=\"e-n-accordion-item\" >\n\t\t\t\t<summary class=\"e-n-accordion-item-title\" data-accordion-index=\"6\" tabindex=\"-1\" aria-expanded=\"false\" aria-controls=\"e-n-accordion-item-1935\" >\n\t\t\t\t\t<span class='e-n-accordion-item-title-header'><div class=\"e-n-accordion-item-title-text\"> OXIDATION FURNACE <\/div><\/span>\n\t\t\t\t\t\t\t\t\t<\/summary>\n\t\t\t\t<div data-particle_enable=\"false\" data-particle-mobile-disabled=\"false\" role=\"region\" aria-labelledby=\"e-n-accordion-item-1935\" class=\"elementor-element elementor-element-a999d29 e-con-full e-flex e-con e-child\" data-id=\"a999d29\" data-element_type=\"container\" data-e-type=\"container\">\n\t\t<div data-particle_enable=\"false\" data-particle-mobile-disabled=\"false\" role=\"region\" aria-labelledby=\"e-n-accordion-item-1935\" class=\"elementor-element elementor-element-4907466 e-flex e-con-boxed e-con e-child\" data-id=\"4907466\" data-element_type=\"container\" data-e-type=\"container\">\n\t\t\t\t\t<div class=\"e-con-inner\">\n\t\t\t\t<div class=\"elementor-element elementor-element-a1c8d28 elementor-widget elementor-widget-image\" data-id=\"a1c8d28\" data-element_type=\"widget\" data-e-type=\"widget\" data-widget_type=\"image.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t\t\t\t\t\t\t\t\t\t\t\t\t<img loading=\"lazy\" decoding=\"async\" width=\"300\" height=\"300\" src=\"https:\/\/www.ukm.my\/imen\/wp-content\/uploads\/2025\/09\/inst_oxidationfurn-300x300.png\" class=\"attachment-medium size-medium wp-image-6116\" alt=\"\" srcset=\"https:\/\/www.ukm.my\/imen\/wp-content\/uploads\/2025\/09\/inst_oxidationfurn-300x300.png 300w, https:\/\/www.ukm.my\/imen\/wp-content\/uploads\/2025\/09\/inst_oxidationfurn-150x150.png 150w, https:\/\/www.ukm.my\/imen\/wp-content\/uploads\/2025\/09\/inst_oxidationfurn.png 383w\" sizes=\"(max-width: 300px) 100vw, 300px\" \/>\t\t\t\t\t\t\t\t\t\t\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-bb70f6a elementor-widget elementor-widget-text-editor\" data-id=\"bb70f6a\" data-element_type=\"widget\" data-e-type=\"widget\" data-widget_type=\"text-editor.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t\t\t\t\t\t\t<p>A high-temperature furnace used for thermal oxidation, annealing, and diffusion drive-in processes in semiconductor fabrication.<\/p><ul><li><p><b>How It Works \/ Principle<\/b> The furnace exposes a silicon wafer to an oxidizing agent (like oxygen or water vapor) in a precisely controlled high-heat environment (up to 1000\u00b0C) to grow a uniform layer of silicon dioxide (<span class=\"math-inline\"><span class=\"katex\"><span class=\"katex-html\" aria-hidden=\"true\"><span class=\"base\"><span class=\"mord mathnormal\">S<\/span><span class=\"mord mathnormal\">i<\/span><span class=\"mord\"><span class=\"mord mathnormal\">O<\/span><span class=\"msupsub\"><span class=\"vlist-t vlist-t2\"><span class=\"vlist-r\"><span class=\"vlist\"><span class=\"\"><span class=\"sizing reset-size6 size3 mtight\"><span class=\"mord mtight\">2<\/span><\/span><\/span><\/span><span class=\"vlist-s\">\u200b<\/span><\/span><\/span><\/span><\/span><\/span><\/span><\/span><\/span>).<\/p><\/li><li><p><b>Key Features &amp; Advantages<\/b><\/p><ul><li><p><b>High-Purity Processing:<\/b> Designed to achieve ultra-precise control over temperature, atmosphere, and cleanliness.<\/p><\/li><li><p><b>Uniform Growth:<\/b> Ensures a uniform, high-quality silicon dioxide layer across the wafer.<\/p><\/li><\/ul><\/li><li><p><b>Applications<\/b> Performing dry oxidation processes and high-temperature annealing of wafers.<\/p><\/li><\/ul>\t\t\t\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t\t<\/details>\n\t\t\t\t\t\t<details id=\"e-n-accordion-item-1936\" class=\"e-n-accordion-item\" >\n\t\t\t\t<summary class=\"e-n-accordion-item-title\" data-accordion-index=\"7\" tabindex=\"-1\" aria-expanded=\"false\" aria-controls=\"e-n-accordion-item-1936\" >\n\t\t\t\t\t<span class='e-n-accordion-item-title-header'><div class=\"e-n-accordion-item-title-text\"> REACTIVE ION ETCHING <\/div><\/span>\n\t\t\t\t\t\t\t\t\t<\/summary>\n\t\t\t\t<div data-particle_enable=\"false\" data-particle-mobile-disabled=\"false\" role=\"region\" aria-labelledby=\"e-n-accordion-item-1936\" class=\"elementor-element elementor-element-45a86c0 e-con-full e-flex e-con e-child\" data-id=\"45a86c0\" data-element_type=\"container\" data-e-type=\"container\">\n\t\t<div data-particle_enable=\"false\" data-particle-mobile-disabled=\"false\" role=\"region\" aria-labelledby=\"e-n-accordion-item-1936\" class=\"elementor-element elementor-element-6530d09 e-flex e-con-boxed e-con e-child\" data-id=\"6530d09\" data-element_type=\"container\" data-e-type=\"container\">\n\t\t\t\t\t<div class=\"e-con-inner\">\n\t\t\t\t<div class=\"elementor-element elementor-element-0f7fe3b elementor-widget elementor-widget-text-editor\" data-id=\"0f7fe3b\" data-element_type=\"widget\" data-e-type=\"widget\" data-widget_type=\"text-editor.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t\t\t\t\t\t\t<p>An advanced etching system used to create high-precision patterns and structures in microfabrication.<\/p><ul><li><p><b>How It Works \/ Principle<\/b> The process takes place in a vacuum chamber where a plasma is generated. A combination of chemical reaction and physical ion bombardment removes material from the wafer surface.<\/p><\/li><li><p><b>Key Features &amp; Advantages<\/b><\/p><ul><li><p><b>Anisotropic Etching:<\/b> Produces highly directional etching, allowing for the creation of vertical sidewalls and high-aspect-ratio structures.<\/p><\/li><\/ul><\/li><li><p><b>Applications<\/b> Etching thin films for advanced materials, microelectronics, and semiconductors.<\/p><\/li><\/ul>\t\t\t\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t\t<\/details>\n\t\t\t\t\t\t<details id=\"e-n-accordion-item-1937\" class=\"e-n-accordion-item\" >\n\t\t\t\t<summary class=\"e-n-accordion-item-title\" data-accordion-index=\"8\" tabindex=\"-1\" aria-expanded=\"false\" aria-controls=\"e-n-accordion-item-1937\" >\n\t\t\t\t\t<span class='e-n-accordion-item-title-header'><div class=\"e-n-accordion-item-title-text\"> KARL-SUSS MJB MASK ALIGNER (MJB 3) <\/div><\/span>\n\t\t\t\t\t\t\t\t\t<\/summary>\n\t\t\t\t<div data-particle_enable=\"false\" data-particle-mobile-disabled=\"false\" role=\"region\" aria-labelledby=\"e-n-accordion-item-1937\" class=\"elementor-element elementor-element-3bdc92c e-con-full e-flex e-con e-child\" data-id=\"3bdc92c\" data-element_type=\"container\" data-e-type=\"container\">\n\t\t<div data-particle_enable=\"false\" data-particle-mobile-disabled=\"false\" role=\"region\" aria-labelledby=\"e-n-accordion-item-1937\" class=\"elementor-element elementor-element-84030f0 e-flex e-con-boxed e-con e-child\" data-id=\"84030f0\" data-element_type=\"container\" data-e-type=\"container\">\n\t\t\t\t\t<div class=\"e-con-inner\">\n\t\t\t\t<div class=\"elementor-element elementor-element-3efef90 elementor-widget elementor-widget-image\" data-id=\"3efef90\" data-element_type=\"widget\" data-e-type=\"widget\" data-widget_type=\"image.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t\t\t\t\t\t\t\t\t\t\t\t\t<img loading=\"lazy\" decoding=\"async\" width=\"300\" height=\"300\" src=\"https:\/\/www.ukm.my\/imen\/wp-content\/uploads\/2025\/09\/inst_karlsuss-300x300.png\" class=\"attachment-medium size-medium wp-image-6118\" alt=\"\" srcset=\"https:\/\/www.ukm.my\/imen\/wp-content\/uploads\/2025\/09\/inst_karlsuss-300x300.png 300w, https:\/\/www.ukm.my\/imen\/wp-content\/uploads\/2025\/09\/inst_karlsuss-150x150.png 150w, https:\/\/www.ukm.my\/imen\/wp-content\/uploads\/2025\/09\/inst_karlsuss.png 474w\" sizes=\"(max-width: 300px) 100vw, 300px\" \/>\t\t\t\t\t\t\t\t\t\t\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-c24398f elementor-widget elementor-widget-text-editor\" data-id=\"c24398f\" data-element_type=\"widget\" data-e-type=\"widget\" data-widget_type=\"text-editor.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t\t\t\t\t\t\t<p>A high-resolution contact mask aligner designed for laboratory and development environments.<\/p><ul><li><p><b>How It Works \/ Principle<\/b> It performs high-precision 1:1 contact printing, transferring a pattern from a mask onto a substrate (like a silicon wafer) coated with photoresist.<\/p><\/li><li><p><b>Key Features &amp; Advantages<\/b><\/p><ul><li><p><b>High Resolution:<\/b> Designed for high-resolution photolithography applications.<\/p><\/li><li><p><b>Substrate Flexibility:<\/b> Accommodates standard wafers up to 3 inches and non-standard, irregularly shaped substrates.<\/p><\/li><\/ul><\/li><li><p><b>Applications<\/b> High-resolution photolithography for R&amp;D and pilot production.<\/p><\/li><\/ul>\t\t\t\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t\t<\/details>\n\t\t\t\t\t\t<details id=\"e-n-accordion-item-1938\" class=\"e-n-accordion-item\" >\n\t\t\t\t<summary class=\"e-n-accordion-item-title\" data-accordion-index=\"9\" tabindex=\"-1\" aria-expanded=\"false\" aria-controls=\"e-n-accordion-item-1938\" >\n\t\t\t\t\t<span class='e-n-accordion-item-title-header'><div class=\"e-n-accordion-item-title-text\"> MIDAS SINGLE SIDE MASK ALIGNER (MDA-400LJ) <\/div><\/span>\n\t\t\t\t\t\t\t\t\t<\/summary>\n\t\t\t\t<div data-particle_enable=\"false\" data-particle-mobile-disabled=\"false\" role=\"region\" aria-labelledby=\"e-n-accordion-item-1938\" class=\"elementor-element elementor-element-e04ff01 e-con-full e-flex e-con e-child\" data-id=\"e04ff01\" data-element_type=\"container\" data-e-type=\"container\">\n\t\t<div data-particle_enable=\"false\" data-particle-mobile-disabled=\"false\" role=\"region\" aria-labelledby=\"e-n-accordion-item-1938\" class=\"elementor-element elementor-element-215f92e e-flex e-con-boxed e-con e-child\" data-id=\"215f92e\" data-element_type=\"container\" data-e-type=\"container\">\n\t\t\t\t\t<div class=\"e-con-inner\">\n\t\t\t\t<div class=\"elementor-element elementor-element-448ce10 elementor-widget elementor-widget-image\" data-id=\"448ce10\" data-element_type=\"widget\" data-e-type=\"widget\" data-widget_type=\"image.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t\t\t\t\t\t\t\t\t\t\t\t\t<img loading=\"lazy\" decoding=\"async\" width=\"300\" height=\"300\" src=\"https:\/\/www.ukm.my\/imen\/wp-content\/uploads\/2025\/09\/inst_maskaligner-300x300.png\" class=\"attachment-medium size-medium wp-image-6119\" alt=\"\" srcset=\"https:\/\/www.ukm.my\/imen\/wp-content\/uploads\/2025\/09\/inst_maskaligner-300x300.png 300w, https:\/\/www.ukm.my\/imen\/wp-content\/uploads\/2025\/09\/inst_maskaligner-150x150.png 150w, https:\/\/www.ukm.my\/imen\/wp-content\/uploads\/2025\/09\/inst_maskaligner.png 383w\" sizes=\"(max-width: 300px) 100vw, 300px\" \/>\t\t\t\t\t\t\t\t\t\t\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-2e9ab69 elementor-widget elementor-widget-text-editor\" data-id=\"2e9ab69\" data-element_type=\"widget\" data-e-type=\"widget\" data-widget_type=\"text-editor.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t\t\t\t\t\t\t<p>A mask aligner designed to provide precise alignment and exposure of photomasks onto substrates for creating intricate microscopic patterns.<\/p><ul><li><p><b>How It Works \/ Principle<\/b> It transfers a pattern from a photomask to a substrate coated with a light-sensitive material (photoresist) using a controlled exposure process.<\/p><\/li><li><p><b>Key Features &amp; Advantages<\/b><\/p><ul><li><p><b>Precise Control:<\/b> Equipped with a modern light source and high-precision manual controls for accurate alignment.<\/p><\/li><li><p><b>Layer-to-Layer Alignment:<\/b> Critical for devices that are built layer-by-layer, requiring precise alignment of multiple masks.<\/p><\/li><\/ul><\/li><li><p><b>Applications<\/b> Photolithography for MEMS devices like sensors and micro-mirrors.<\/p><\/li><\/ul>\t\t\t\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t\t<\/details>\n\t\t\t\t\t\t<details id=\"e-n-accordion-item-1939\" class=\"e-n-accordion-item\" >\n\t\t\t\t<summary class=\"e-n-accordion-item-title\" data-accordion-index=\"10\" tabindex=\"-1\" aria-expanded=\"false\" aria-controls=\"e-n-accordion-item-1939\" >\n\t\t\t\t\t<span class='e-n-accordion-item-title-header'><div class=\"e-n-accordion-item-title-text\"> PROGRAMMABLE SPIN COATER <\/div><\/span>\n\t\t\t\t\t\t\t\t\t<\/summary>\n\t\t\t\t<div data-particle_enable=\"false\" data-particle-mobile-disabled=\"false\" role=\"region\" aria-labelledby=\"e-n-accordion-item-1939\" class=\"elementor-element elementor-element-20d505b e-con-full e-flex e-con e-child\" data-id=\"20d505b\" data-element_type=\"container\" data-e-type=\"container\">\n\t\t<div data-particle_enable=\"false\" data-particle-mobile-disabled=\"false\" role=\"region\" aria-labelledby=\"e-n-accordion-item-1939\" class=\"elementor-element elementor-element-13fdd4b e-flex e-con-boxed e-con e-child\" data-id=\"13fdd4b\" data-element_type=\"container\" data-e-type=\"container\">\n\t\t\t\t\t<div class=\"e-con-inner\">\n\t\t\t\t<div class=\"elementor-element elementor-element-4617dce elementor-widget elementor-widget-image\" data-id=\"4617dce\" data-element_type=\"widget\" data-e-type=\"widget\" data-widget_type=\"image.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t\t\t\t\t\t\t\t\t\t\t\t\t<img loading=\"lazy\" decoding=\"async\" width=\"300\" height=\"300\" src=\"https:\/\/www.ukm.my\/imen\/wp-content\/uploads\/2025\/09\/inst_progspincoater-300x300.png\" class=\"attachment-medium size-medium wp-image-6120\" alt=\"\" srcset=\"https:\/\/www.ukm.my\/imen\/wp-content\/uploads\/2025\/09\/inst_progspincoater-300x300.png 300w, https:\/\/www.ukm.my\/imen\/wp-content\/uploads\/2025\/09\/inst_progspincoater-150x150.png 150w, https:\/\/www.ukm.my\/imen\/wp-content\/uploads\/2025\/09\/inst_progspincoater.png 399w\" sizes=\"(max-width: 300px) 100vw, 300px\" \/>\t\t\t\t\t\t\t\t\t\t\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-8c3e1fb elementor-widget elementor-widget-text-editor\" data-id=\"8c3e1fb\" data-element_type=\"widget\" data-e-type=\"widget\" data-widget_type=\"text-editor.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t\t\t\t\t\t\t<p>A reliable and user-friendly instrument for applying a uniform coating of photoresist onto substrates.<\/p><ul><li><p><b>How It Works \/ Principle<\/b> It uses multi-step spin processes where the speed, acceleration, and duration are tightly controlled to spread a liquid evenly across a substrate, achieving a desired film thickness.<\/p><\/li><li><p><b>Key Features &amp; Advantages<\/b><\/p><ul><li><p><b>Substrate Size:<\/b> Up to 3 inches<\/p><\/li><li><p><b>Max. speed:<\/b> 8000 RPM<\/p><\/li><li><p><b>Programmable:<\/b> Allows for repeatable, multi-step recipes for precise thickness control.<\/p><\/li><\/ul><\/li><li><p><b>Applications<\/b> Applying photoresist for photolithography.<\/p><\/li><\/ul>\t\t\t\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t\t<\/details>\n\t\t\t\t\t\t<details id=\"e-n-accordion-item-19310\" class=\"e-n-accordion-item\" >\n\t\t\t\t<summary class=\"e-n-accordion-item-title\" data-accordion-index=\"11\" tabindex=\"-1\" aria-expanded=\"false\" aria-controls=\"e-n-accordion-item-19310\" >\n\t\t\t\t\t<span class='e-n-accordion-item-title-header'><div class=\"e-n-accordion-item-title-text\"> PHOTORESIST SPIN COATER <\/div><\/span>\n\t\t\t\t\t\t\t\t\t<\/summary>\n\t\t\t\t<div data-particle_enable=\"false\" data-particle-mobile-disabled=\"false\" role=\"region\" aria-labelledby=\"e-n-accordion-item-19310\" class=\"elementor-element elementor-element-d950cb1 e-con-full e-flex e-con e-child\" data-id=\"d950cb1\" data-element_type=\"container\" data-e-type=\"container\">\n\t\t<div data-particle_enable=\"false\" data-particle-mobile-disabled=\"false\" role=\"region\" aria-labelledby=\"e-n-accordion-item-19310\" class=\"elementor-element elementor-element-2bd6ac6 e-flex e-con-boxed e-con e-child\" data-id=\"2bd6ac6\" data-element_type=\"container\" data-e-type=\"container\">\n\t\t\t\t\t<div class=\"e-con-inner\">\n\t\t\t\t<div class=\"elementor-element elementor-element-bea15e9 elementor-widget elementor-widget-image\" data-id=\"bea15e9\" data-element_type=\"widget\" data-e-type=\"widget\" data-widget_type=\"image.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t\t\t\t\t\t\t\t\t\t\t\t\t<img loading=\"lazy\" decoding=\"async\" width=\"300\" height=\"300\" src=\"https:\/\/www.ukm.my\/imen\/wp-content\/uploads\/2025\/09\/inst_jephotoresist-300x300.png\" class=\"attachment-medium size-medium wp-image-6121\" alt=\"\" srcset=\"https:\/\/www.ukm.my\/imen\/wp-content\/uploads\/2025\/09\/inst_jephotoresist-300x300.png 300w, https:\/\/www.ukm.my\/imen\/wp-content\/uploads\/2025\/09\/inst_jephotoresist-150x150.png 150w, https:\/\/www.ukm.my\/imen\/wp-content\/uploads\/2025\/09\/inst_jephotoresist.png 383w\" sizes=\"(max-width: 300px) 100vw, 300px\" \/>\t\t\t\t\t\t\t\t\t\t\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-a18bac6 elementor-widget elementor-widget-text-editor\" data-id=\"a18bac6\" data-element_type=\"widget\" data-e-type=\"widget\" data-widget_type=\"text-editor.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t\t\t\t\t\t\t<p>A reliable and user-friendly instrument for applying uniform thin films (polymers, photoresists) onto substrates.<\/p><ul><li><p><b>How It Works \/ Principle<\/b> The process relies on centrifugal force to spread a liquid photoresist and achieve a highly uniform thickness across a substrate, such as a silicon wafer or glass slide.<\/p><\/li><li><p><b>Key Features &amp; Advantages<\/b><\/p><ul><li><p><b>Substrate Size:<\/b> Up to 3 inches<\/p><\/li><li><p><b>Max. speed:<\/b> 5000 RPM<\/p><\/li><li><p><b>Uniform Coatings:<\/b> Excellent for creating consistent thin films.<\/p><\/li><\/ul><\/li><li><p><b>Applications<\/b> Applying photoresist for photolithography.<\/p><\/li><\/ul>\t\t\t\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t\t<\/details>\n\t\t\t\t\t\t<details id=\"e-n-accordion-item-19311\" class=\"e-n-accordion-item\" >\n\t\t\t\t<summary class=\"e-n-accordion-item-title\" data-accordion-index=\"12\" tabindex=\"-1\" aria-expanded=\"false\" aria-controls=\"e-n-accordion-item-19311\" >\n\t\t\t\t\t<span class='e-n-accordion-item-title-header'><div class=\"e-n-accordion-item-title-text\"> LCR METER <\/div><\/span>\n\t\t\t\t\t\t\t\t\t<\/summary>\n\t\t\t\t<div data-particle_enable=\"false\" data-particle-mobile-disabled=\"false\" role=\"region\" aria-labelledby=\"e-n-accordion-item-19311\" class=\"elementor-element elementor-element-3fa8ab9 e-con-full e-flex e-con e-child\" data-id=\"3fa8ab9\" data-element_type=\"container\" data-e-type=\"container\">\n\t\t<div data-particle_enable=\"false\" data-particle-mobile-disabled=\"false\" role=\"region\" aria-labelledby=\"e-n-accordion-item-19311\" class=\"elementor-element elementor-element-d3e3a6c e-flex e-con-boxed e-con e-child\" data-id=\"d3e3a6c\" data-element_type=\"container\" data-e-type=\"container\">\n\t\t\t\t\t<div class=\"e-con-inner\">\n\t\t\t\t<div class=\"elementor-element elementor-element-db4f4c6 elementor-widget elementor-widget-image\" data-id=\"db4f4c6\" data-element_type=\"widget\" data-e-type=\"widget\" data-widget_type=\"image.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t\t\t\t\t\t\t\t\t\t\t\t\t<img loading=\"lazy\" decoding=\"async\" width=\"300\" height=\"300\" src=\"https:\/\/www.ukm.my\/imen\/wp-content\/uploads\/2025\/09\/inst_lcrmeteragilent-300x300.png\" class=\"attachment-medium size-medium wp-image-6122\" alt=\"\" srcset=\"https:\/\/www.ukm.my\/imen\/wp-content\/uploads\/2025\/09\/inst_lcrmeteragilent-300x300.png 300w, https:\/\/www.ukm.my\/imen\/wp-content\/uploads\/2025\/09\/inst_lcrmeteragilent-150x150.png 150w, https:\/\/www.ukm.my\/imen\/wp-content\/uploads\/2025\/09\/inst_lcrmeteragilent.png 383w\" sizes=\"(max-width: 300px) 100vw, 300px\" \/>\t\t\t\t\t\t\t\t\t\t\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-c2660b9 elementor-widget elementor-widget-text-editor\" data-id=\"c2660b9\" data-element_type=\"widget\" data-e-type=\"widget\" data-widget_type=\"text-editor.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t\t\t\t\t\t\t<ul><li><p>A versatile test instrument used to accurately measure the <b>Inductance (L)<\/b>, <b>Capacitance (C)<\/b>, and <b>Resistance (R)<\/b> of electronic components.<\/p><ul><li><p><b>How It Works \/ Principle<\/b> It applies a known AC voltage at a specific frequency to a component. By measuring the resulting current and the phase shift between the voltage and current, it precisely calculates the L, C, and R values.<\/p><\/li><li><p><b>Key Features &amp; Advantages<\/b><\/p><ul><li><p><b>Model:<\/b> Agilent 4284A<\/p><\/li><li><p><b>Wide Frequency Range:<\/b> Allows for testing components under a broad spectrum of operating conditions.<\/p><\/li><li><p><b>High Speed &amp; Accuracy:<\/b> Delivers fast and reliable measurements suitable for R&amp;D and quality control.<\/p><\/li><\/ul><\/li><li><p><b>Applications<\/b> Quality assurance for passive components (inductors, capacitors, resistors), material characterization, and general electronics testing.<\/p><\/li><\/ul><\/li><\/ul>\t\t\t\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t\t<\/details>\n\t\t\t\t\t\t<details id=\"e-n-accordion-item-19312\" class=\"e-n-accordion-item\" >\n\t\t\t\t<summary class=\"e-n-accordion-item-title\" data-accordion-index=\"13\" tabindex=\"-1\" aria-expanded=\"false\" aria-controls=\"e-n-accordion-item-19312\" >\n\t\t\t\t\t<span class='e-n-accordion-item-title-header'><div class=\"e-n-accordion-item-title-text\"> KEITHLEY SEMICONDUCTOR ANALYZER <\/div><\/span>\n\t\t\t\t\t\t\t\t\t<\/summary>\n\t\t\t\t<div data-particle_enable=\"false\" data-particle-mobile-disabled=\"false\" role=\"region\" aria-labelledby=\"e-n-accordion-item-19312\" class=\"elementor-element elementor-element-79a3145 e-con-full e-flex e-con e-child\" data-id=\"79a3145\" data-element_type=\"container\" data-e-type=\"container\">\n\t\t<div data-particle_enable=\"false\" data-particle-mobile-disabled=\"false\" role=\"region\" aria-labelledby=\"e-n-accordion-item-19312\" class=\"elementor-element elementor-element-8369a6d e-flex e-con-boxed e-con e-child\" data-id=\"8369a6d\" data-element_type=\"container\" data-e-type=\"container\">\n\t\t\t\t\t<div class=\"e-con-inner\">\n\t\t\t\t<div class=\"elementor-element elementor-element-ddb63e4 elementor-widget elementor-widget-image\" data-id=\"ddb63e4\" data-element_type=\"widget\" data-e-type=\"widget\" data-widget_type=\"image.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t\t\t\t\t\t\t\t\t\t\t\t\t<img loading=\"lazy\" decoding=\"async\" width=\"300\" height=\"300\" src=\"https:\/\/www.ukm.my\/imen\/wp-content\/uploads\/2025\/09\/inst_keithSAn-300x300.png\" class=\"attachment-medium size-medium wp-image-6124\" alt=\"\" srcset=\"https:\/\/www.ukm.my\/imen\/wp-content\/uploads\/2025\/09\/inst_keithSAn-300x300.png 300w, https:\/\/www.ukm.my\/imen\/wp-content\/uploads\/2025\/09\/inst_keithSAn-150x150.png 150w, https:\/\/www.ukm.my\/imen\/wp-content\/uploads\/2025\/09\/inst_keithSAn.png 383w\" sizes=\"(max-width: 300px) 100vw, 300px\" \/>\t\t\t\t\t\t\t\t\t\t\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-52af801 elementor-widget elementor-widget-text-editor\" data-id=\"52af801\" data-element_type=\"widget\" data-e-type=\"widget\" data-widget_type=\"text-editor.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t\t\t\t\t\t\t<ul><li><p>An advanced instrument that performs detailed electrical characterization of semiconductor devices and materials. \u26a1<\/p><ul><li><p><b>How It Works \/ Principle<\/b> It applies precise voltages or currents to a device while simultaneously measuring the resulting electrical response. This allows it to map out the device&#8217;s electrical behavior, such as conductivity and capacitance, under various conditions.<\/p><\/li><li><p><b>Key Features &amp; Advantages<\/b><\/p><ul><li><p><b>Model:<\/b> Keithley 4200<\/p><\/li><li><p><b>Versatile Test Suite:<\/b> Capable of performing a wide range of automated electrical tests.<\/p><\/li><li><p><b>Measures:<\/b> I-V (current-voltage), C-V (capacitance-voltage), and transient (time-varying) characteristics.<\/p><\/li><\/ul><\/li><li><p><b>Applications<\/b> Characterizing transistors, diodes, and sensors; failure analysis of electronic components; and research on new semiconductor materials.<\/p><\/li><\/ul><\/li><\/ul>\t\t\t\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t\t<\/details>\n\t\t\t\t\t\t<details id=\"e-n-accordion-item-19313\" class=\"e-n-accordion-item\" >\n\t\t\t\t<summary class=\"e-n-accordion-item-title\" data-accordion-index=\"14\" tabindex=\"-1\" aria-expanded=\"false\" aria-controls=\"e-n-accordion-item-19313\" >\n\t\t\t\t\t<span class='e-n-accordion-item-title-header'><div class=\"e-n-accordion-item-title-text\"> CORONA DISCHARGE <\/div><\/span>\n\t\t\t\t\t\t\t\t\t<\/summary>\n\t\t\t\t<div data-particle_enable=\"false\" data-particle-mobile-disabled=\"false\" role=\"region\" aria-labelledby=\"e-n-accordion-item-19313\" class=\"elementor-element elementor-element-6380e8e e-con-full e-flex e-con e-child\" data-id=\"6380e8e\" data-element_type=\"container\" data-e-type=\"container\">\n\t\t<div data-particle_enable=\"false\" data-particle-mobile-disabled=\"false\" role=\"region\" aria-labelledby=\"e-n-accordion-item-19313\" class=\"elementor-element elementor-element-569b404 e-flex e-con-boxed e-con e-child\" data-id=\"569b404\" data-element_type=\"container\" data-e-type=\"container\">\n\t\t\t\t\t<div class=\"e-con-inner\">\n\t\t\t\t<div class=\"elementor-element elementor-element-a44966f elementor-widget elementor-widget-image\" data-id=\"a44966f\" data-element_type=\"widget\" data-e-type=\"widget\" data-widget_type=\"image.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t\t\t\t\t\t\t\t\t\t\t\t\t<img loading=\"lazy\" decoding=\"async\" width=\"300\" height=\"300\" src=\"https:\/\/www.ukm.my\/imen\/wp-content\/uploads\/2025\/09\/inst_coronadisc-300x300.png\" class=\"attachment-medium size-medium wp-image-6125\" alt=\"\" srcset=\"https:\/\/www.ukm.my\/imen\/wp-content\/uploads\/2025\/09\/inst_coronadisc-300x300.png 300w, https:\/\/www.ukm.my\/imen\/wp-content\/uploads\/2025\/09\/inst_coronadisc-150x150.png 150w, https:\/\/www.ukm.my\/imen\/wp-content\/uploads\/2025\/09\/inst_coronadisc.png 383w\" sizes=\"(max-width: 300px) 100vw, 300px\" \/>\t\t\t\t\t\t\t\t\t\t\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-937b12c elementor-widget elementor-widget-text-editor\" data-id=\"937b12c\" data-element_type=\"widget\" data-e-type=\"widget\" data-widget_type=\"text-editor.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t\t\t\t\t\t\t<ul><li><p>A lab instrument used to modify a material&#8217;s surface to improve its ability to bond with inks, coatings, or adhesives.<\/p><ul><li><p><b>How It Works \/ Principle<\/b> The instrument generates a high-voltage electrical field that ionizes the surrounding air, creating a plasma (the &#8220;corona&#8221;). This plasma bombards the material&#8217;s surface, breaking molecular bonds and increasing its surface energy, making it more receptive to adhesion.<\/p><\/li><li><p><b>Key Features &amp; Advantages<\/b><\/p><ul><li><p><b>Model:<\/b> BD-20V (ETP)<\/p><\/li><li><p><b>Targeted Treatment:<\/b> Designed for treating small, specific surface areas.<\/p><\/li><li><p><b>Effective Adhesion Promotion:<\/b> Significantly increases the surface energy of non-receptive materials like polymers.<\/p><\/li><\/ul><\/li><li><p><b>Applications<\/b> Surface treating polymers and other materials before printing, bonding, or coating to ensure strong and lasting adhesion.<\/p><\/li><\/ul><\/li><\/ul>\t\t\t\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t\t<\/details>\n\t\t\t\t\t\t<details id=\"e-n-accordion-item-19314\" class=\"e-n-accordion-item\" >\n\t\t\t\t<summary class=\"e-n-accordion-item-title\" data-accordion-index=\"15\" tabindex=\"-1\" aria-expanded=\"false\" aria-controls=\"e-n-accordion-item-19314\" >\n\t\t\t\t\t<span class='e-n-accordion-item-title-header'><div class=\"e-n-accordion-item-title-text\"> CLEANING (WET BENCH) <\/div><\/span>\n\t\t\t\t\t\t\t\t\t<\/summary>\n\t\t\t\t<div data-particle_enable=\"false\" data-particle-mobile-disabled=\"false\" role=\"region\" aria-labelledby=\"e-n-accordion-item-19314\" class=\"elementor-element elementor-element-1da79e1 e-con-full e-flex e-con e-child\" data-id=\"1da79e1\" data-element_type=\"container\" data-e-type=\"container\">\n\t\t<div data-particle_enable=\"false\" data-particle-mobile-disabled=\"false\" role=\"region\" aria-labelledby=\"e-n-accordion-item-19314\" class=\"elementor-element elementor-element-f2eabd0 e-flex e-con-boxed e-con e-child\" data-id=\"f2eabd0\" data-element_type=\"container\" data-e-type=\"container\">\n\t\t\t\t\t<div class=\"e-con-inner\">\n\t\t\t\t<div class=\"elementor-element elementor-element-aae4dae elementor-widget elementor-widget-text-editor\" data-id=\"aae4dae\" data-element_type=\"widget\" data-e-type=\"widget\" data-widget_type=\"text-editor.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t\t\t\t\t\t\t<ul><li><p>A specialized workstation designed for chemical processes like wet etching in a controlled and safe environment. \ud83e\uddea<\/p><ul><li><p><b>How It Works \/ Principle<\/b> It uses liquid chemicals (acids or bases) to dissolve and remove unwanted material from a substrate surface. This process, known as isotropic etching, uniformly removes material in all directions.<\/p><\/li><li><p><b>Key Features &amp; Advantages<\/b><\/p><ul><li><p><b>Safety Focused:<\/b> Equipped with dedicated exhaust systems and ventilation to safely remove chemical fumes and vapors.<\/p><\/li><li><p><b>Controlled Environment:<\/b> Provides a contained space specifically for handling hazardous liquid chemicals in microfabrication.<\/p><\/li><\/ul><\/li><li><p><b>Applications<\/b> Performing wet etching, chemical cleaning of wafers, and other liquid-based chemical processes in semiconductor and MEMS fabrication.<\/p><\/li><\/ul><\/li><\/ul>\t\t\t\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t\t<\/details>\n\t\t\t\t\t<\/div>\n\t\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t<div data-particle_enable=\"false\" data-particle-mobile-disabled=\"false\" class=\"elementor-element elementor-element-2c6d272 e-flex e-con-boxed e-con e-parent\" data-id=\"2c6d272\" data-element_type=\"container\" data-e-type=\"container\">\n\t\t\t\t\t<div class=\"e-con-inner\">\n\t\t<div data-particle_enable=\"false\" data-particle-mobile-disabled=\"false\" class=\"elementor-element elementor-element-5ac2b3ed e-grid e-con-full e-con e-child\" data-id=\"5ac2b3ed\" data-element_type=\"container\" data-e-type=\"container\">\n\t\t\t\t<div class=\"elementor-element elementor-element-3ad42feb elementor-align-center elementor-widget__width-initial elementor-widget elementor-widget-button\" data-id=\"3ad42feb\" data-element_type=\"widget\" data-e-type=\"widget\" data-widget_type=\"button.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t\t\t\t\t\t\t<div class=\"elementor-button-wrapper\">\n\t\t\t\t\t<a class=\"elementor-button elementor-button-link elementor-size-sm elementor-animation-grow\" href=\"https:\/\/www.ukm.my\/imen\/en\/ijana\/\">\n\t\t\t\t\t\t<span class=\"elementor-button-content-wrapper\">\n\t\t\t\t\t\t\t\t\t<span class=\"elementor-button-text\">iJANA<\/span>\n\t\t\t\t\t<\/span>\n\t\t\t\t\t<\/a>\n\t\t\t\t<\/div>\n\t\t\t\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-40f69184 elementor-align-center elementor-widget__width-initial elementor-widget elementor-widget-button\" data-id=\"40f69184\" data-element_type=\"widget\" data-e-type=\"widget\" data-widget_type=\"button.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t\t\t\t\t\t\t<div class=\"elementor-button-wrapper\">\n\t\t\t\t\t<a class=\"elementor-button elementor-button-link elementor-size-sm elementor-animation-grow\" href=\"https:\/\/www.ukm.my\/imen\/en\/admission\/form-download\/\">\n\t\t\t\t\t\t<span class=\"elementor-button-content-wrapper\">\n\t\t\t\t\t\t\t\t\t<span class=\"elementor-button-text\">lab form<\/span>\n\t\t\t\t\t<\/span>\n\t\t\t\t\t<\/a>\n\t\t\t\t<\/div>\n\t\t\t\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t<div data-particle_enable=\"false\" data-particle-mobile-disabled=\"false\" class=\"elementor-element elementor-element-763264e4 e-flex e-con-boxed e-con e-parent\" data-id=\"763264e4\" data-element_type=\"container\" data-e-type=\"container\">\n\t\t\t\t\t<div class=\"e-con-inner\">\n\t\t\t\t<div class=\"elementor-element elementor-element-5181d5be elementor-view-default elementor-widget elementor-widget-icon\" data-id=\"5181d5be\" data-element_type=\"widget\" data-e-type=\"widget\" data-widget_type=\"icon.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t\t\t\t\t<div class=\"elementor-icon-wrapper\">\n\t\t\t<a class=\"elementor-icon\" href=\"https:\/\/www.ukm.my\/imen\/wp-admin\/post.php?post=6062&#038;action=elementor\">\n\t\t\t<svg aria-hidden=\"true\" class=\"e-font-icon-svg e-fas-pencil-alt\" viewBox=\"0 0 512 512\" xmlns=\"http:\/\/www.w3.org\/2000\/svg\"><path d=\"M497.9 142.1l-46.1 46.1c-4.7 4.7-12.3 4.7-17 0l-111-111c-4.7-4.7-4.7-12.3 0-17l46.1-46.1c18.7-18.7 49.1-18.7 67.9 0l60.1 60.1c18.8 18.7 18.8 49.1 0 67.9zM284.2 99.8L21.6 362.4.4 483.9c-2.9 16.4 11.4 30.6 27.8 27.8l121.5-21.3 262.6-262.6c4.7-4.7 4.7-12.3 0-17l-111-111c-4.8-4.7-12.4-4.7-17.1 0zM124.1 339.9c-5.5-5.5-5.5-14.3 0-19.8l154-154c5.5-5.5 14.3-5.5 19.8 0s5.5 14.3 0 19.8l-154 154c-5.5 5.5-14.3 5.5-19.8 0zM88 424h48v36.3l-64.5 11.3-31.1-31.1L51.7 376H88v48z\"><\/path><\/svg>\t\t\t<\/a>\n\t\t<\/div>\n\t\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t","protected":false},"excerpt":{"rendered":"<p>CLEANROOM LAB. Our MEMS Fabrication Laboratory supports the design, fabrication, and characterization of Micro-Electro-Mechanical Systems (MEMS) devices. These micro-devices are created from silicon and similar<a class=\"ut-readmore\" href=\"https:\/\/www.ukm.my\/imen\/cleanroom\/\"> &#8230;<\/a><\/p>\n","protected":false},"author":1,"featured_media":0,"parent":0,"menu_order":0,"comment_status":"closed","ping_status":"closed","template":"","meta":{"footnotes":""},"class_list":["post-6062","page","type-page","status-publish","hentry"],"aioseo_notices":[],"_links":{"self":[{"href":"https:\/\/www.ukm.my\/imen\/wp-json\/wp\/v2\/pages\/6062","targetHints":{"allow":["GET"]}}],"collection":[{"href":"https:\/\/www.ukm.my\/imen\/wp-json\/wp\/v2\/pages"}],"about":[{"href":"https:\/\/www.ukm.my\/imen\/wp-json\/wp\/v2\/types\/page"}],"author":[{"embeddable":true,"href":"https:\/\/www.ukm.my\/imen\/wp-json\/wp\/v2\/users\/1"}],"replies":[{"embeddable":true,"href":"https:\/\/www.ukm.my\/imen\/wp-json\/wp\/v2\/comments?post=6062"}],"version-history":[{"count":41,"href":"https:\/\/www.ukm.my\/imen\/wp-json\/wp\/v2\/pages\/6062\/revisions"}],"predecessor-version":[{"id":6969,"href":"https:\/\/www.ukm.my\/imen\/wp-json\/wp\/v2\/pages\/6062\/revisions\/6969"}],"wp:attachment":[{"href":"https:\/\/www.ukm.my\/imen\/wp-json\/wp\/v2\/media?parent=6062"}],"curies":[{"name":"wp","href":"https:\/\/api.w.org\/{rel}","templated":true}]}}